Wafer Surface Analyzer   SEO-PIONEER300

The Pioneer 300 Wafer Surface Analysis System is specially designed for use in 300 mm semiconductor wafer processing for quality control. The Pioneer 300 provides quick and accurate contact angle/surface energy measurements of the wafer surface to adhension, cleanliness and surface treatments.
The use of anti-static materials in the Pioneer 300 makes it well suited for semiconductor applications. The inner porions are specially designed to prevent particulate formation or contamination and the system can be used to monitor the ultra clean surfce processing of silicon wafers.
The position of the sample stage is computer controlled and can be precisely adjusted along the x-,y-, or z- axis. The user can easily control the position of the stage to allow for wafer surface mapping.
The instrument uses  micro-pump controlled by PC for precise and repeatable liquid drop formation and application. This insures that a reproducible drop volume is applied to the surface.

applications

 1. Coating assessment of the HMDS process.
 2. Wafer mapping Display for surface contamintion detection.
 3. Adhesive and primer preparation.
 4. Coating uniformity & Coating quality.

         Specifications