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 Chemicals For OLED
- N,N'-Bis(3-methylphenyl)-N,N'-Bis(phenyl)benzidine
(TPD)
- N,N,N',N'-Tetraphenylbenzidine
(TPBD)
- N,N'-Di-(Naphthalen-1-yl)-N,N'-Diphenylbenzidine
- Triphenylenelamine
(TPA)
- Tris(8-hydroxyquionlianato)-aluminum
(AlQ3)
- 4,4-Bis(2,2-diphenyl-ethen-1-yl)-bipheyl
(DPVBi)
- 4,4'-Bis(carbazol-9-yl)biphenyl
- N,N,N',N' - Tetrakis(4-methylphenyl)-benzidine
- Photochemicals
- 2,3,4,4'-Tetrahydroxybenzlophenone(THBP)
- 4-tert-Butyl-4'-methoxy-dibenzoylmethane
(Avobenzone;Parsol 1798)
- Intermediates for
pharmaceuticals
- "CBZ"-Protected
Amino Acid
- "t-Boc"-Protected
Amino Acid
- Isooctyl stearate(Min.99.0%)
- Proline Benzyl Ester
Hydrochloride (Min. 98.5%)
- Enkephalin
- 2,2,2-Trifluoroacetophenone
- Quinoxaline
- 2,3-Pyrazine dicarboxylic
acid
- Methyl paraben
- Ethyl paraben
- Propyl paraben
- Butyl paraben
- Photo resist for positive
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Chemical composition
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Ester
of 2-diazo-1-naphthol-5-sulphonic acid
and novolak resin.
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Application
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Used
for positive type PS plate coating.
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Soluble in
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glycol
ethers, alcohols
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Specification
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Good
stability and ease of develoment with
alkaline solutions.
High
resolution and sensitivity.
Run
length up to 100,000 impresses.
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Coating thickness
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2.0±2.0§
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Drying
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125±10¡É,
1min
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Solid content
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40±1%
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Packing
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18Kg
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www.labkorea.com ® All right reserved
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